염소계 플라즈마를 이용한 구리박막의 건식 식각기구에 관한 연구A study on the dry etching mechanism of copper film in chlorine-based plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이원종 | - |
| dc.contributor.advisor | Lee, Won-Jong | - |
| dc.contributor.author | 이성권 | - |
| dc.contributor.author | Lee, Sung-Kwon | - |
| dc.date.accessioned | 2011-12-15T01:02:49Z | - |
| dc.date.available | 2011-12-15T01:02:49Z | - |
| dc.date.issued | 1997 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113003&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50171 | - |
| dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.2, [ iii, 134 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 표면분석 | - |
| dc.subject | 전자자기공명 | - |
| dc.subject | 기구 | - |
| dc.subject | 식각 | - |
| dc.subject | 구리 | - |
| dc.subject | 반도체 | - |
| dc.subject | Semiconductor | - |
| dc.subject | XPS | - |
| dc.subject | ECR | - |
| dc.subject | Mechanism | - |
| dc.subject | Etching | - |
| dc.subject | Copper | - |
| dc.title | 염소계 플라즈마를 이용한 구리박막의 건식 식각기구에 관한 연구 | - |
| dc.title.alternative | A study on the dry etching mechanism of copper film in chlorine-based plasma | - |
| dc.type | Thesis(Ph.D) | - |
| dc.identifier.CNRN | 113003/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000935257 | - |
| dc.contributor.localauthor | 이성권 | - |
| dc.contributor.localauthor | Lee, Sung-Kwon | - |
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