증착률 균일화를 위한 화학증착 반응로에서 운전조건 및 형상 최적화에 관한 연구Operating condition and shape optimization of a CVD reactor for uniform film growth
- Advisors
- 최도형researcher; Choi, Do-Hyungresearcher
- Description
- 한국과학기술원 : 기계공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 150537/325007 / 000945818
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 기계공학과, 1999.2, [ xv, 156 p. ]
- Keywords
최적화; 화학증착; 전산유체역학; 균일도; Uniformity; Optimization; CVD; CFD
- Appears in Collection
- ME-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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