Nanolithography using micro-scale mask enabled by hyperbolic metamaterial
We newly developed a nano-scale patterning method overcoming the diffraction limit of conventional photo-lithography technique by utilizing micro-scale aluminum mask-hyperbolic metamaterials hybrid structures, which is supported by our numerical simulation and experimental results.
- Issue Date
- 2015-08
- Language
- English
- Citation
11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015
- Appears in Collection
- RIMS Conference Papers
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.