Nanolithography using micro-scale mask enabled by hyperbolic metamaterial
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Donghwan | ko |
| dc.contributor.author | Cho, Yong Rae | ko |
| dc.contributor.author | Min, Bumki | ko |
| dc.date.accessioned | 2023-11-21T12:01:14Z | - |
| dc.date.available | 2023-11-21T12:01:14Z | - |
| dc.date.created | 2023-11-21 | - |
| dc.date.issued | 2015-08 | - |
| dc.identifier.citation | 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/315008 | - |
| dc.description.abstract | We newly developed a nano-scale patterning method overcoming the diffraction limit of conventional photo-lithography technique by utilizing micro-scale aluminum mask-hyperbolic metamaterials hybrid structures, which is supported by our numerical simulation and experimental results. | - |
| dc.language | English | - |
| dc.publisher | Institute of Electrical and Electronics Engineers Inc. | - |
| dc.title | Nanolithography using micro-scale mask enabled by hyperbolic metamaterial | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-84962800167 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | Busan | - |
| dc.identifier.doi | 10.1109/CLEOPR.2015.7376518 | - |
| dc.contributor.nonIdAuthor | Cho, Yong Rae | - |
| dc.contributor.nonIdAuthor | Min, Bumki | - |
- Appears in Collection
- RIMS Conference Papers
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.