Nitrogen Doping Engineering through NH3 Plasma Treatment for Enhancement Mode MoS2 Thin-Film Transistors

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Publisher
National Research Foundation of Korea
Issue Date
2022-07-06
Language
English
Citation

The 10th International Workshop on 2D Materials

URI
http://hdl.handle.net/10203/301126
Appears in Collection
EE-Conference Papers(학술회의논문)
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