Nitrogen Doping Engineering through NH3 Plasma Treatment for Enhancement Mode MoS2 Thin-Film Transistors
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kang, Mingu | ko |
| dc.contributor.author | Choi, Sung-Yool | ko |
| dc.date.accessioned | 2022-11-28T06:03:19Z | - |
| dc.date.available | 2022-11-28T06:03:19Z | - |
| dc.date.created | 2022-11-27 | - |
| dc.date.issued | 2022-07-06 | - |
| dc.identifier.citation | The 10th International Workshop on 2D Materials | - |
| dc.identifier.uri | http://hdl.handle.net/10203/301126 | - |
| dc.language | English | - |
| dc.publisher | National Research Foundation of Korea | - |
| dc.title | Nitrogen Doping Engineering through NH3 Plasma Treatment for Enhancement Mode MoS2 Thin-Film Transistors | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 10th International Workshop on 2D Materials | - |
| dc.identifier.conferencecountry | CC | - |
| dc.identifier.conferencelocation | Virtual | - |
| dc.contributor.localauthor | Choi, Sung-Yool | - |
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