DSpace at KOASAS: Enhancement mode MoS2 FET engineering via O2 plasma treatment with Al2O3 barrier layer

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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Enhancement mode MoS2 FET engineering via O2 plasma treatment with Al2O3 barrier layer

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Lee, Inseong / Kang, Mingu / Park, Seo Hak / Choi, Sung-Yool researcher

Publisher: Recent Progress in Graphene and Two-dimensional Materials Research Conference

Issue Date: 2022-11-16

Language: English

Citation: The 13th Recent Progress in Graphene and Two-dimensional Materials Research Conference (RPGR 2022)

URI: http://hdl.handle.net/10203/301120

Appears in Collection: EE-Conference Papers(학술회의논문)

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