Enhancement mode MoS2 FET engineering via O2 plasma treatment with Al2O3 barrier layer
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Inseong | ko |
| dc.contributor.author | Kang, Mingu | ko |
| dc.contributor.author | Park, Seo Hak | ko |
| dc.contributor.author | Choi, Sung-Yool | ko |
| dc.date.accessioned | 2022-11-28T06:02:22Z | - |
| dc.date.available | 2022-11-28T06:02:22Z | - |
| dc.date.created | 2022-11-27 | - |
| dc.date.issued | 2022-11-16 | - |
| dc.identifier.citation | The 13th Recent Progress in Graphene and Two-dimensional Materials Research Conference (RPGR 2022) | - |
| dc.identifier.uri | http://hdl.handle.net/10203/301120 | - |
| dc.language | English | - |
| dc.publisher | Recent Progress in Graphene and Two-dimensional Materials Research Conference | - |
| dc.title | Enhancement mode MoS2 FET engineering via O2 plasma treatment with Al2O3 barrier layer | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 13th Recent Progress in Graphene and Two-dimensional Materials Research Conference (RPGR 2022) | - |
| dc.identifier.conferencecountry | CH | - |
| dc.identifier.conferencelocation | CHANG YUNG-FA FOUNDATION International Convention Center | - |
| dc.contributor.localauthor | Choi, Sung-Yool | - |
| dc.contributor.nonIdAuthor | Lee, Inseong | - |
| dc.contributor.nonIdAuthor | Kang, Mingu | - |
| dc.contributor.nonIdAuthor | Park, Seo Hak | - |
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