Ferroelectric FETs using hafnium zirconium oxide thin films and its applications하프늄 지르코늄 옥사이드 박막을 활용한 강유전체 전계 효과 트랜지스터와 그 응용

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The semiconductor market continues to grow, leading to personal computers and mobile phones, and is now entering a new phase with the emergence of the internet of things (IoT), autonomous vehicles, and artificial intelligence (AI) technologies. In particular, application processors required for various portable devices are attempting to incorporate non-volatile memory or neuromorphic systems to meet the needs of new markets. In the meantime, research on embedding next-generation memory such as RRAM, PRAM, and MRAM into the application processor has been carried out, but it is still difficult in terms of stable operation and mass production possibility. Therefore, the development of a new memory device compatible with the logic process can be regarded as a research topic suitable for the market demand in recent years. This research covers the development of ferroelectric field-effect transistors (FeFETs) for non-volatile memories and neuromorphic systems, utilizing ferroelectric hafnium zirconium oxide (HZO) thin films that can be easily embedded in the application processors. Highly scalable devices based on junctionless (JL) ferroelectric fin and gate-all-around (GAA) FETs are presented. The memory and synaptic behaviors of the JL metal-ferroelectric-insulator-silicon (MFIS) FeFETs were experimentally demonstrated after verifying ferroelectric characteristics of the HZO thin films using metal-ferroelectric-metal (MFM) capacitors. The fabricated device showed distinguishable polarization switching behaviors with controllable channel conductance. From neural network simulations based on the synaptic characteristics of the proposed JL ferroelectric FinFET, the pattern recognition accuracy for hand-written digits was validated to be approximately 80% for neuromorphic applications. The results of this research are expected to play an important role in easily integrating non-volatile memory and neuromorphic systems for brain-inspired computing into the next-generation application processors.
Advisors
Choi, Yang-Kyuresearcher최양규researcher
Description
한국과학기술원 :전기및전자공학부,
Publisher
한국과학기술원
Issue Date
2020
Identifier
325007
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 전기및전자공학부, 2020.8,[vii, 74 p. :]

Keywords

Ferroelectric▼aHafnium Zirconium Oxide▼aJuntionless FET▼aFinFET▼aGate-all-around FET▼aNon-Volatile Memory▼aNeuromorphic System▼aSynapse▼aLogic aApplication Processor; 강유전체▼a하프늄 지르코늄 옥사이드▼a정션이 없는 전계 효과 트랜지스터▼a비휘발성 메모리▼a뉴로모픽 시스템▼a시냅스 소자▼a로직▼a애플리케이션 프로세서

URI
http://hdl.handle.net/10203/284443
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=924531&flag=dissertation
Appears in Collection
EE-Theses_Ph.D.(박사논문)
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