Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching

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In this article, the fabrication process of annular photonic crystals on silicon-on-insulator wafers was addressed for the first time. A self-alignment procedure for nanofabrication using atomic layer deposition and sacrificial etching was established to place accurately nanosized dielectric rods in nanosized circular air holes. Avoiding the challenging electron-beam lithography alignment, this method achieves atomic level precision and shows high stability. (C) 2009 American Vacuum Society. [DO]: 10.1116/1.3079662]
Publisher
A V S AMER INST PHYSICS
Issue Date
2009-03
Language
English
Article Type
Article
Citation

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.27, no.2, pp.568 - 572

ISSN
1071-1023
DOI
10.1116/1.3079662
URI
http://hdl.handle.net/10203/282644
Appears in Collection
EE-Journal Papers(저널논문)
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