선택적 에피택시법에 의한 표면 방출형 AlGa/GaAs 반도체 레이저 다이오드의 생산방법

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Assignee
KAIST
Country
JA (Japan)
Issue Date
1995-07-28
Application Date
1988-10-28
Application Number
63-271131
Registration Date
1995-07-28
Registration Number
1955184
URI
http://hdl.handle.net/10203/257308
Appears in Collection
EE-Patent(특허)
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