The present invention discloses a kind of MEMS manufacture method that amorphous carbon film is utilized as to sacrifice layer.According to one embodiment of the invention, comprise the following steps:Form substructure thing;As sacrifice layer, amorphous carbon film is formed on the substructure thing;Being formed on the amorphous carbon film includes the superstructure of sensor construction;Arrange with eliminating the amorphous carbon film and make the substructure thing and the superstructure mutually isolated.