멤스 디바이스 제조방법Method for making MEMS devices
The present invention discloses a kind of MEMS manufacture method that amorphous carbon film is utilized as to sacrifice layer.According to one embodiment of the invention, comprise the following steps：Form substructure thing；As sacrifice layer, amorphous carbon film is formed on the substructure thing；Being formed on the amorphous carbon film includes the superstructure of sensor construction；Arrange with eliminating the amorphous carbon film and make the substructure thing and the superstructure mutually isolated.
- Assignee
- KAIST
- Country
- CC (Cocos (Keeling) Islands)
- Issue Date
- 2018-02-13
- Application Date
- 2013-02-01
- Application Number
- 201380071919.3
- Registration Date
- 2018-02-13
- Registration Number
- 104955765
- Appears in Collection
- EE-Patent(특허)
- Files in This Item
- There are no files associated with this item.
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