멤스 디바이스 제조방법Method for making MEMS devices
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 나노팹 | ko |
| dc.contributor.author | 임성규 | ko |
| dc.contributor.author | 김영수 | ko |
| dc.contributor.author | 김희연 | ko |
| dc.contributor.author | 강민호 | ko |
| dc.contributor.author | 오재섭 | ko |
| dc.contributor.author | 이귀로 | ko |
| dc.date.accessioned | 2019-04-15T17:14:19Z | - |
| dc.date.available | 2019-04-15T17:14:19Z | - |
| dc.date.issued | 2018-02-13 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/256495 | - |
| dc.description.abstract | The present invention discloses a kind of MEMS manufacture method that amorphous carbon film is utilized as to sacrifice layer.According to one embodiment of the invention, comprise the following steps：Form substructure thing；As sacrifice layer, amorphous carbon film is formed on the substructure thing；Being formed on the amorphous carbon film includes the superstructure of sensor construction；Arrange with eliminating the amorphous carbon film and make the substructure thing and the superstructure mutually isolated. | - |
| dc.title | 멤스 디바이스 제조방법 | - |
| dc.title.alternative | Method for making MEMS devices | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | 이귀로 | - |
| dc.contributor.nonIdAuthor | 임성규 | - |
| dc.contributor.nonIdAuthor | 김영수 | - |
| dc.contributor.nonIdAuthor | 김희연 | - |
| dc.contributor.nonIdAuthor | 강민호 | - |
| dc.contributor.nonIdAuthor | 오재섭 | - |
| dc.contributor.assignee | KAIST | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 201380071919.3 | - |
| dc.identifier.patentRegistrationNumber | 104955765 | - |
| dc.date.application | 2013-02-01 | - |
| dc.date.registration | 2018-02-13 | - |
| dc.publisher.country | CC | - |
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