Effect of activation of oxygen by electron cyclotron resonance plasma on the incorporation of Pb in the deposition of Pb(Zr,Ti)O-3 films by DC magnetron reactive sputtering
Pb(Zr,Ti)O-3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O-3 films With stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO2/Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.
- Publisher
- JAPAN J APPLIED PHYSICS
- Issue Date
- 1997-09
- Language
- English
- Article Type
- Article
- Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.36, no.9A, pp.5663 - 5669
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
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