DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, ST | ko |
dc.contributor.author | Kim, HH | ko |
dc.contributor.author | Kim, YI | ko |
dc.contributor.author | Lee, MY | ko |
dc.contributor.author | Lee, Won-Jong | ko |
dc.date.accessioned | 2011-09-19T07:38:35Z | - |
dc.date.available | 2011-09-19T07:38:35Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997-09 | - |
dc.identifier.citation | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.36, no.9A, pp.5663 - 5669 | - |
dc.identifier.uri | http://hdl.handle.net/10203/25235 | - |
dc.description.abstract | Pb(Zr,Ti)O-3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O-3 films With stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO2/Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation. | - |
dc.description.sponsorship | The authors acknowledge the support of Samsung Electronics Co., Ltd. in this research. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | JAPAN J APPLIED PHYSICS | - |
dc.title | Effect of activation of oxygen by electron cyclotron resonance plasma on the incorporation of Pb in the deposition of Pb(Zr,Ti)O-3 films by DC magnetron reactive sputtering | - |
dc.type | Article | - |
dc.identifier.wosid | A1997YE80400053 | - |
dc.identifier.scopusid | 2-s2.0-0031220601 | - |
dc.type.rims | ART | - |
dc.citation.volume | 36 | - |
dc.citation.issue | 9A | - |
dc.citation.beginningpage | 5663 | - |
dc.citation.endingpage | 5669 | - |
dc.citation.publicationname | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | - |
dc.identifier.doi | 10.1143/JJAP.36.5663 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Lee, Won-Jong | - |
dc.contributor.nonIdAuthor | Kim, ST | - |
dc.contributor.nonIdAuthor | Kim, HH | - |
dc.contributor.nonIdAuthor | Kim, YI | - |
dc.contributor.nonIdAuthor | Lee, MY | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | lead zirconate titanate | - |
dc.subject.keywordAuthor | thin film | - |
dc.subject.keywordAuthor | sputtering | - |
dc.subject.keywordAuthor | ECR plasma | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | PB(ZR | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.