Low-voltage dc thin-film electroluminescence with an indium-tin-oxide/CaS : Pb/ZnS/Al structure

Cited 2 time in webofscience Cited 3 time in scopus
  • Hit : 263
  • Download : 0
A dc thin-film electroluminescent (TFEL) device has been fabricated to achieve low voltage operation and high-luminance blue emission. The device is based on an [Al/ZnS/luminescent CaS:Pb/indium-tin-oxide] structure in which electrons can be injected into the luminescent layer at high energy due to the field-induced acceleration of electron carriers within the ZnS layer. The blue-emitting CaS:Pb and ZnS layers were consecutively prepared by atomic layer deposition. Preliminary results obtained from this device indicate a threshold voltage for light emission of as low as 17 V and a higher luminous efficiency of 0.1-0.36 lm/W compared with that of CaS:Pb ac TFEL.
Publisher
JAPAN SOC APPLIED PHYSICS
Issue Date
2003-05
Language
English
Article Type
Article
Keywords

DEVICE; CAS

Citation

JAPANESE JOURNAL OF APPLIED PHYSICS, v.42, no.5, pp.L520 - L522

ISSN
0021-4922
DOI
10.1143/JJAP.42.L520
URI
http://hdl.handle.net/10203/201848
Appears in Collection
MS-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 2 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0