Showing results 1 to 3 of 3
Highly Manufacturable Device Isolation Technology Using Laser-Induced Epitaxial Growth for Monolithic Stack Devices Son, Yong-Hoon; Baik, Seung Jae; Jeon, Sanghun; Lee, Jong-Wook; Hwang, Gihyun; Shin, Yoo Gyun; Yoon, Euijoon, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.58, no.11, pp.3863 - 3868, 2011-11 |
Optical evidence of amorphous-network change in the initial-growth stage a-Si : H Jun, KH; Lim, Koeng Su; Kim, SY; Kim, SJ, JOURNAL OF NON-CRYSTALLINE SOLIDS, v.275, no.1-2, pp.59 - 64, 2000-09 |
RECRYSTALLIZATION OF LPCVD AMORPHOUS SI FILMS USING F+ IMPLANTATION PARK, JW; MOON, DG; Ahn, Byung Tae; Lim, Ho Bin; Lee, Kwyro, THIN SOLID FILMS, v.245, no.1-2, pp.228 - 233, 1994-06 |
Discover