Browse "School of Electrical Engineering(전기및전자공학부)" by Author Lin, W
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| Effects of Post-Decoupled-Plasma-Nitridation Annealing of Ultra-Thin Gate Oxide Cho, Byung Jin; Lek, CM; Loh, WY; Ang, CH; Lin, W; Tan, YL; Zhen, JZ; et al, 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp.0 - 0, 2002-07-08 |
| Suppression of nitridation-induced interface traps and hole mobility degradation by nitrogen plasma nitridation Ang, CH; Tan, SS; Lek, CM; Lin, W; Zheng, ZJ; Chen, T; Cho, Byung Jin, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.4, pp.26 - 28, 2002-04 |
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