Transmission electron microscopy study of $ZnO/Al_{2}O_{3}$ based thin film transistor grown by atomic layer deposition method = ALD 방법으로 증착된 $ZnO/Al_{2}O_{3}$ 기반 박막형 트랜지스터의 투과전자현미경 연구

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Advisors
Lee, Jeong-Yongresearcher이 정 용
Description
한국과학기술원 : 신소재공학과,
Publisher
한국과학기술원
Issue Date
2011
Identifier
482603/325007  / 020075155
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 신소재공학과, 2011.8, [ xii, 158 p. ]

Keywords

ZnO; atomic layer deposition; high-k dielectric material; ZnAl2O4; 원자층증착법; ZnO; 고유전율재료; ZnAl2O4; 박막형 트랜지스터; thin film transistor

URI
http://hdl.handle.net/10203/181956
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=482603&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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