Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Author Rha, Sa-Kyun
Showing results 1 to 6 of 6
| Atomic Layer Deposition of Silicon Nitride Thin Film Park, Chong-Ook; Lee, Joo-Hyeon; Kim, Hyuk; Lee, Yeon-Seong; Rha, Sa-Kyun; Lee, Won-Jun, AVS Topical Conference ALD 2002, pp.P-14 -, 2002 |
| Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3) Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008 |
| Cu/TiN/Ti/Si 다층막의 열처리에 관한 연구 = A study on the annealing of the Cu/TiN/Ti/Si Multilayerlink 라사균; Rha, Sa-Kyun; 박종욱; 천성순; et al, 한국과학기술원, 1997 |
| Growth studies and characterization of silicon nitride thin films deposited by alternating exposures to Si2Cl6 and NH3 Park, Kwangchol; Yun, Won-Deok; Choi, Byoung-Jun; Kim, Heon-Do; Lee, Won-Jun; Rha, Sa-Kyun; Park, Chong-Ook, THIN SOLID FILMS, v.517, no.14, pp.3975 - 3978, 2009-05 |
| Improved Copper Chemical Vapor Deposition Process by Applying Substrate Bias Park, Chong-Ook; Lee, Won-Jun; Rha, Sa-Kyun; Lee, Seung-Yun; Kim, Dong-Won; Chun, Soung-Soon, 1996 MRS Spring Symposium, v.427, pp.207 - 212, 1996-04-08 |
| The electrical properties of dielectric stacks of SiO2 and Al2O3 prepared by atomic layer deposition method Han, Byeol; Lee, Seung-Won; Park, Kwangchol; Park, Chong-Ook; Rha, Sa-Kyun; Lee, Won-Jun, CURRENT APPLIED PHYSICS, v.12, no.2, pp.434 - 436, 2012-03 |
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