Showing results 1 to 8 of 8
Area-selective atomic layer deposition on 2D monolayer lateral superlattices Park, Jeongwon; Kwak, Seung Jae; Kang, Sumin; Oh, Saeyoung; Shin, Bongki; Noh, Gichang; Kim, TaeSoo; et al, NATURE COMMUNICATIONS, v.15, no.1, 2024-03 |
Diffusion Control on the Van der Waals Surface of Monolayers for Uniform Bi-Layer MoS2 Growth Kim, TaeSoo; Noh, Gichang; Kwon, Seongdae; Kim, Ji Yoon; Dhakal, Krishna P.; Oh, Saeyoung; Chai, Hyun-Jun; et al, ADVANCED FUNCTIONAL MATERIALS, v.34, no.23, 2024-06 |
Gas-Phase Alkali Metal-Assisted MOCVD Growth of 2D Transition Metal Dichalcogenides for Large-Scale Precise Nucleation Control Kim, Tae Soo; Dhakal, Krishna P.; Park, Eunpyo; Noh, Gichang; Chai, Hyun-Jun; Kim, Youngbum; Oh, Saeyoung; et al, SMALL, v.18, no.20, 2022-05 |
Growth and Interlayer Engineering of 2D Layered Semiconductors for Future Electronics Song, Chanwoo; Noh, Gichang; Kim, Tae Soo; Kang, Minsoo; Song, Hwayoung; Ham, Ayoung; Jo, Min-kyung; et al, ACS NANO, v.14, no.12, pp.16266 - 16300, 2020-12 |
Large Memory Window of van der Waals Heterostructure Devices Based on MOCVD-Grown 2D Layered Ge4Se9 Noh, Gichang; Song, Hwayoung; Choi, Heenang; Kim, Mingyu; Jeong, Jae Hwan; Lee, Yongjoon; Choi, Min-Yeong; et al, ADVANCED MATERIALS, v.34, no.41, 2022-10 |
Layer-Controlled Growth of Single-Crystalline 2D Bi2O2Se Film Driven by Interfacial Reconstruction Kang, Minsoo; Jeong, Han Beom; Shim, Yoonsu; Chai, Hyun-Jun; Kim, Yong-Sung; Choi, Minhyuk; Ham, Ayoung; et al, ACS NANO, v.18, no.1, pp.819 - 828, 2023-12 |
Low-Temperature and High-Quality Growth of Bi2O2 Se Layered Semiconductors via Cracking Metal-Organic Chemical Vapor Deposition Kang, Minsoo; Chai, Hyun-Jun; Jeong, Han Beom; Park, Cheolmin; Jung, In-young; Park, Eunpyo; Çiçek, Mert Miraç; et al, ACS NANO, v.15, no.5, pp.8715 - 8723, 2021-05 |
Single-Crystalline Monolayer Bismuth Oxyselenide Growth Using Metal-Organic Chemical Vapor Deposition Kang, Minsoo; Kang, Kibum; Chai, Hyun-Jun, Advanced Epitaxy for Freestanding Membranes and 2D Materials, AEFM 2022, Massachusetts Institute of Technology, 2022-07-06 |
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