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A comparative study on the Si precursors for the atomic layer deposition of silicon nitride thin films Lee, WJ; Lee, JH; Park, Chong-Ook; Lee, YS; Shin, SJ; Rha, SK, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.5, pp.1352 - 1355, 2004-11 |
Effects of the partial pressure of copper (I) hexafluoroacetylacetonate trimethylvinylsilane on the chemical vapor deposition of copper Lee, SY; Rha, SK; Lee, WJ; Kim, DW; Hwang, JS; Park, Chong-Ook, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.36, pp.5249 - 5252, 1997-01 |
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