Showing results 1 to 2 of 2
Role of postannealing temperature on the microstructure of Al2O3/ZnO thin films grown by atomic layer deposition for TFT applications Jang, Yong-Woon; Bang, Seok-Hwan; Jeon, Hyeong-Tag; Lee, Jeong-Yong, PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, v.207, no.9, pp.2185 - 2189, 2010-09 |
Transmission electron microscopy study of $ZnO/Al_{2}O_{3}$ based thin film transistor grown by atomic layer deposition method = ALD 방법으로 증착된 $ZnO/Al_{2}O_{3}$ 기반 박막형 트랜지스터의 투과전자현미경 연구link Jang, Yong-Woon; 장용운; et al, 한국과학기술원, 2011 |
Discover