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Showing results 1 to 6 of 6

1
(A) study on the atomic layer deposition of Ru and $RuO_2$ thin films = Ruthenium과 ruthenium oxide 박막의 ALD 증착과 특성에 관한 연구link

Kim, Jae-Hoon; 김재훈; et al, 한국과학기술원, 2003

2
(A) study on the ruthenium thin films formed by atomic layer deposition (ALD) = ALD 증착법으로 형성된 ruthenium 박막의 특성에 관한 연구link

Kwon, Oh-Kyum; 권오겸; et al, 한국과학기술원, 2004

3
Annealing of RuO2 and Ru bottom electrodes and its effects on the electrical properties of (Ba,Sr)TiO3 thin films

Kim, Ho Gi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.37, no.1, pp.284 - 289, 1998

4
Composition and electrical properties of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor

Choi, J; Choi, Y; Hong, J; Tian, H; Roh, JS; Kim, Y; Chung, TM; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, pp.6852 - 6856, 2002-11

5
Oxygen diffusion through RuO2 bottom electrode of integrated ferroelectric capacitors

Ahn, JH; Lee, WJ; Kim, Ho Gi, MATERIALS LETTERS, v.38, no.4, pp.250 - 253, 1999-02

6
Surface and interface microstructural properties of Ru thin films grown on InSb (111) substrates at room temperature

Kim, TW; Lee, DU; Lee, JH; Yoon, YS; Lee, JeongYong; Park, HL, APPLIED SURFACE SCIENCE, v.161, no.3-4, pp.452 - 458, 2000-07

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