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ArF laser lithography 용 위상 변위 막을 위한 Transition metal (Hf, Zr) oxide, oxynitride 박막의 전자 상태 및 광학 특성 분석 = The electronic structures and optical properties of transition metal (Hf, Zr) oxide and oxynitride thin films as phase shift mask for ArF laser lithographylink 김성관; Kim, Sung-Kwan; et al, 한국과학기술원, 2006 |
Defect-Engineered Electroforming-Free Analog HfOx Memristor and Its Application to the Neural Network Kim, Gil Seop; Song, Hanchan; Lee, Yoon Kyeung; Kim, Ji Hun; Kim, Woohyun; Park, Tae Hyung; Kim, Hae Jin; et al, ACS APPLIED MATERIALS & INTERFACES, v.11, no.50, pp.47063 - 47072, 2019-12 |
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