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The effects of substrate temperature and lead precursor flow rate on the fabrication of (Pb,La)(Zr,Ti)O-3 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition Shin, JS; Chun , Soung Soon; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2200 - 2206, 1997-04 |
염소계 플라즈마를 이용한 구리박막의 건식 식각기구에 관한 연구 = A study on the dry etching mechanism of copper film in chlorine-based plasmalink 이성권; Lee, Sung-Kwon; et al, 한국과학기술원, 1997 |
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