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Showing results 9 to 13 of 13

9
MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILM PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

KIM, I; AHN, SD; CHO, BW; Ahn, SungTae; Lee, JeongYong; CHUN, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.33, no.12A, pp.6691 - 6698, 1994-12

10
$O_2/Cl_2$ ECR 플라즈마를 이용한 $RuO_2$ 박막의 건식 식각특성에 관한 연구 = Dry etching chacrateristics of $RuO_2$ thin film in $O_2/Cl_2$ electron cycl0tron resonance plasmalink

김종삼; Kim, Jong-Sam; et al, 한국과학기술원, 1997

11
(Pb,La)(Zr,Ti)O-3 thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition for the charge storage capacitor of a gigabit-scale dynamic random access memory

Shin, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.1, pp.198 - 203, 1998-01

12
The effects of substrate temperature and lead precursor flow rate on the fabrication of (Pb,La)(Zr,Ti)O-3 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Shin, JS; Chun , Soung Soon; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2200 - 2206, 1997-04

13
염소계 플라즈마를 이용한 구리박막의 건식 식각기구에 관한 연구 = A study on the dry etching mechanism of copper film in chlorine-based plasmalink

이성권; Lee, Sung-Kwon; et al, 한국과학기술원, 1997

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