Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Title
Showing results 11781 to 11800 of 19469
| Plasma-enhanced ALD of titanium-silicon-nitride using TiCl4, SiH4, and N-2/H-2/Ar plasma Park, JS; Kang, SW, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.7, no.8, pp.C87 - C89, 2004 |
| Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4, SiH4, and N2/H2/Ar Plasma KANG SANG WON, Atomic Layer Deposition (ALD) 2002, 2002-01-01 |
| Plasma-Enhanced Atomic Layer Deposition of Aluminum Grown by a Sequential Supply of TMA and H2 Kang, Sang-Won, 3rd International AVS Conference on Microelectronics and Interfaces, ICMI, 2002-02 |
| Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006 |
| Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for the Application of Cu Diffusion Barrier KANG SANG WON, AVS 6th International Conference on Atomic Layer Deposition, pp.0 - 0, 2004-08-01 |
| Plasma-enhanced atomic layer deposition of ruthenium thin films Kwon, OK; Kwon, SH; Park, HS; Kang, SW, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.7, no.4, pp.C46 - C48, 2004 |
| Plasma-enhanced atomic layer deposition of Ta-N thin films Park, JS; Park, HS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.1, pp.28 - 32, 2002-01 |
| Plasma-enhanced atomic layer deposition of TaN thin films using tantalum-pentafluoride and N-2/H-2/Ar plasma Chung, Hoi-Sung; Kwon, Jung-Dae; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.11, pp.C751 - C754, 2006 |
| Plasma-enhanced atomic layer deposition of tantalum nitrides using hydrogen radicals as a reducing agent Park, JS; Lee, MJ; Lee, CS; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.4, no.4, pp.17 - 19, 2001-04 |
| Plasma-Enhanced Atomic Layer Deposition of TiAlN KANG SANG WON, 4th International AVS Conference on Microelectronics and Interfaces, pp.0 - 0, 2003-01-01 |
| Plasma-enhanced atomic layer deposition of TiN thin film using TiCl4 and N2/H2/Ar radicals KANG SANG WON, Atomic layer Deposition (ALD) 2002, 2002-01-01 |
| Plasma-Enhanced Atomic Layer Deposition Processed SiO2 Gate Insulating Layer for High Mobility Top-Gate Structured Oxide Thin-Film Transistors Ko, Jong Beom; Yeom, Hye In; Park, Sang-Hee Ko, IEEE ELECTRON DEVICE LETTERS, v.37, no.1, pp.39 - 42, 2016-01 |
| Plasma-Enhanced Atomic Layer Depposition of HfO2 Thin Films Using Oxygen Plasma Sang-Won Kang, 208th Meeting of The Electrochemical Society, 2005 |
| Plasma-etched Nanofiber Anisotropic Conductive Films (ACFs) for Ultra Fine Pitch Interconnection Lee, Sang Hoon; Kim, Tae Wan; Paik, Kyung-Wook, 65th Electronic Components and Technology Conference, IEEE Electronic Components and Technology Conference, 2015-05-27 |
| Plasma-sprayed Al-21Ti-23Cr coating for oxidation protection of TiAl alloys Lee, JK; Oh, MH; Lee, HK; Wee, Dang-Moon, SURFACE COATINGS TECHNOLOGY, v.182, no.2-3, pp.363 - 369, 2004-04 |
| Plasmon-Enhanced Photodetection in Ferromagnet/Nonmagnet Spin Thermoelectric Structures Jeon, Chul-Yeon; Baek, Kwang-Min; Kim, Shinho; Kim, Dong-Jun; Jang, Min Seok; Jung, Yeon Sik; Park, Byong-Guk, ADVANCED FUNCTIONAL MATERIALS, v.28, no.40, 2018-08 |
| Plasmon-modulated fluorescence nanoprobes for enzyme-free DNA detection via target signal enhancement and off-target quenching Choi, Shinyoung; Nam, Yoon Sung, BIOSENSORS & BIOELECTRONICS, v.210, 2022-08 |
| Plasmonic and Magnetic Hybrid Au/Ni Particles for DNA Sensing based on Plasmon-enhanced Fluorescence 남윤성, 2019 춘계한국바이오칩학회, 한국바이오칩학회, 2019-05-15 |
| Plasmonic Au Half Shell Particles for DNA Sensing based on Plasmon-enhanced Fluorescence CHOI, SHINYOUNG; Nam, Yoon Sung, Electronic Materials and Nanotechnology for Green Environment (ENGE2020), The Korean Institute of Metals and Materials, 2020-11-04 |
| A plasmonic biosensor array by block copolymer lithography† Shin, Dong Ok; Jeong, Jong-Ryul; Han, Tae Hee; Koo, Chong Min; Park, Hye-Jeong; Lim, Yong Taik; Kim, Sang Ouk, Journal of Materials Chemistry, Vol.20, 2010 |
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