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Comparison of the stress between rapid thermal annealed and excimer laser annealed polycrystalline silicon thin films Lee, CW; Ko, MK; Woo, SL; Oh, HW; Gho, SJ; Lee, JeongYong, SOLID STATE COMMUNICATIONS, v.105, no.12, pp.777 - 781, 1998-03 |
TEM Studies of Plasma Deposited Tungsten and Tungsten Nitride Barriers from Thermally Stable Metallization Lee, Jeong Yong; Lee, Choochon; Lee, CW; Kim, YT; Min, SK; Lee, JY; Park, YW, MRS Symposium Proc., pp.335 - 340, 1994-12-01 |
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