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A study on the behavior of water absorption of SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition method Kim, SP; Choi, Si-Kyung; Park, Y; Chung, I, Thin Films: Stresses and Mechanical Properties IX, v.695, pp.245 - 250, 2001-11-26 |
Effect of N2O plasma treatment on the stabilization of water absorption in fluorinated silicon-oxide thin films fabricated by electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition Kim, SP; Choi, Si-Kyung; Park, Y; Chung, I, APPLIED PHYSICS LETTERS, v.80, no.10, pp.1728 - 1730, 2002-03 |
Effect of water absorption on the residual stress in fluorinated silicon-oxide thin films fabricated by electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition Kim, SP; Choi, Si-Kyung; Park, Y; Chung, I, APPLIED PHYSICS LETTERS, v.79, no.2, pp.185 - 187, 2001-07 |
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