A study on the behavior of water absorption of SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition method
- Issue Date
- 2001-11-26
- Language
- ENG
- Citation
Thin Films: Stresses and Mechanical Properties IX, v.695, pp.245 - 250
- ISSN
- 0272-9172
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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