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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

A study on the behavior of water absorption of SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition method

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dc.contributor.authorKim, SP-
dc.contributor.authorChoi, Si-Kyung-
dc.contributor.authorPark, Y-
dc.contributor.authorChung, I-
dc.date.accessioned2013-03-16T09:36:21Z-
dc.date.available2013-03-16T09:36:21Z-
dc.date.created2012-02-06-
dc.date.issued2001-11-26-
dc.identifier.citationThin Films: Stresses and Mechanical Properties IX, v.695, no., pp.245 - 250-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/10203/129934-
dc.languageENG-
dc.titleA study on the behavior of water absorption of SiOF thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition method-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0036352241-
dc.type.rimsCONF-
dc.citation.volume695-
dc.citation.beginningpage245-
dc.citation.endingpage250-
dc.citation.publicationnameThin Films: Stresses and Mechanical Properties IX-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorChoi, Si-Kyung-
dc.contributor.nonIdAuthorKim, SP-
dc.contributor.nonIdAuthorPark, Y-
dc.contributor.nonIdAuthorChung, I-
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MS-Conference Papers(학술회의논문)
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