Water soluble block-co-polymers as dispersive materials for Two-photon lithographic microfabrication of pure metallic microstructures

Abstract

Microstructures containing noble metals like silver or gold are of interest for applications in biotechnology, photonics and electronics. Quantum size effects become relevant in noble metal nanoparticles. Because of this there are a many issues regarding the use of photo-lithography in fabricating noble metal containing microstructures including undesirable optical and thermal effects. Realizing well defined ordered structures containing noble metals is hence a challenge in the realm of microfabrication. In the presented work we have described the synthesis, characterization and application of water soluble block co polymers from Poly(ethylene glycol) methyl ether methacrylate (PEGMEMA) and Sodium 4-vinylbenzenesulfonate (SSNa). The block-co-polymers were synthesized using the RAFT technique. These polymers were employed as dispersive media for metal salts for direct photowriting of metallic microstructures with two-photon lithography.