Deep X-ray Lithography using Mask with Integrated Electrostatic and Electrothermal Actuators

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 369
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorLee, Seung Seob-
dc.date.accessioned2013-03-28T10:28:58Z-
dc.date.available2013-03-28T10:28:58Z-
dc.date.created2012-02-06-
dc.date.issued2012-
dc.identifier.citation5th Int. Workshop on High-Aspect-Ratio Micro-Structure Technology (HARMST’03),, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/164892-
dc.languageENG-
dc.titleDeep X-ray Lithography using Mask with Integrated Electrostatic and Electrothermal Actuators-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname5th Int. Workshop on High-Aspect-Ratio Micro-Structure Technology (HARMST’03),-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorLee, Seung Seob-
Appears in Collection
ME-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0