DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Seung Seob | - |
dc.date.accessioned | 2013-03-28T10:28:58Z | - |
dc.date.available | 2013-03-28T10:28:58Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | 5th Int. Workshop on High-Aspect-Ratio Micro-Structure Technology (HARMST’03),, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/164892 | - |
dc.language | ENG | - |
dc.title | Deep X-ray Lithography using Mask with Integrated Electrostatic and Electrothermal Actuators | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | 5th Int. Workshop on High-Aspect-Ratio Micro-Structure Technology (HARMST’03), | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Lee, Seung Seob | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.