다중스케일 모델링을 이용한 나노임프린트 리소그라피 전산모사

Abstract

Nano-Imprint Lithography(NIL) is a patterning technique at nano-size in limelight of requesting to reduce thespace between patterns. NIL is modeled under systematic multiscale consideration for a coarse grained molecular dynamics model. Force fields of a united atom model and a bead-spring model for the resin materials, obtained from fitting with the quantum mechanical solution, are employed for computation. The initial configuration of the polymer resin for UV nano imprinting is obtained from Monte Carlo simulation and the initial relaxation procedure. To simulate NIL process, we employ the Nose-Poincare thermostat for temperature controlled Molecular Dynamics (MD), which exhibits enhanced numerical stability even when the temperature fluctuation is large in the case of small number of particles system. Various aspects of NIL process from the mechanics view are discussed based on the numerical solution from the present multiscale modeling.