진동 둔감 광 간섭계를 이용한 실리콘 웨이퍼 표면형상 측정Profile measurements of silicon wafers using a vibration-desensitized optical interferometer

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dc.contributor.author권택민-
dc.contributor.author김학용-
dc.contributor.author김승우-
dc.contributor.author이은상-
dc.contributor.author이상열-
dc.date.accessioned2013-03-18T21:05:43Z-
dc.date.available2013-03-18T21:05:43Z-
dc.date.created2012-03-21-
dc.date.issued2006-06-
dc.identifier.citation대한기계학회 2006년 춘계학술대회, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/152434-
dc.description.abstractWe devised a vibration-insensitive interferometer with a common-path scheme of generating the reference wave directly by transmitting the measurement wave through a single-mode fiber. This fiber-diffraction interferometer enables to cancel out the dominating vibration effect encountered commonly in both the reference and measurement waves in the due course of the two waves’ interference. Besides, to suppresss parasite vibration disturbances caused to interferometer hardware components, a special type of spatial phase-shifter is added to capture four phase-shifted interferograms simultaneously without time delay using a single camera shot. The proposed interferometer system is capable of providing a high level of vibration immunity that is found useful for testing large scaledsilicon wafer's surface profile when sufficient ground isolation for anti-vibration is not feasible.-
dc.languageKOR-
dc.publisher대한기계학회-
dc.title진동 둔감 광 간섭계를 이용한 실리콘 웨이퍼 표면형상 측정-
dc.title.alternativeProfile measurements of silicon wafers using a vibration-desensitized optical interferometer-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname대한기계학회 2006년 춘계학술대회-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor김승우-
dc.contributor.nonIdAuthor권택민-
dc.contributor.nonIdAuthor김학용-
dc.contributor.nonIdAuthor이은상-
dc.contributor.nonIdAuthor이상열-
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ME-Conference Papers(학술회의논문)
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