나노 복화(複畵)공정을 이용한 직접적 패터닝에 관한 연구

Abstract

A method of patterning submicron detailed figures, called as a nano replication printing (nRP), with two-photon-absorbed polymerization initiated by a femtosecond Ti:sapphire laser is proposed. In this method, the laser is scanned on a photosensitive urethane acrylate monomer resin, to induce photo-polymerization by two photon absorption along the rows of a voxel matrix transformed from a bitmap picture. The replicated figures with various dimensions, including sizes down to ~ 15 ㎛, can be fabricated experimentally with edge resolution of around 200㎚. Through the nRP process, the nano/micro-scaled direct patterning without any mask using a black-and-white type of bitmap file can be technologically feasible. The effectiveness of the proposed process has been verified by pattering several figures.