Effects of Oxygen on the property of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor
- Issue Date
- 2003-12-13
- Language
- ENG
- Citation
4th Asian Meeting on Ferroelectrics, v.0, no.0, pp.0 - 0
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.