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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

High-K HfAlO Charge Trapping Layer in SONOS-type Nonvolatile Memory Device for High Speed Operation

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Cho, Byung Jinresearcher / Tan, YN / Chim, WK / Choi, WK / Sig, JM / Hau, NT
Issue Date
2004-12-13
Language
ENG
Citation

International Electron Device Meeting (IEDM), December 2004, pp.889 - 892

URI
http://hdl.handle.net/10203/150855
Appears in Collection
EE-Conference Papers(학술회의논문)
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