Characterization of polysiloxane modified polysilsesquioxane films for low dielectric applications: Microstructure, electrical properties and mechanical properties
- Issue Date
- 2002-04-01
- Language
- ENG
- Citation
Silicon Materials - Processing, Characterization and Reliability, v.716, pp.337 - 342
- ISSN
- 0272-9172
- Appears in Collection
- CH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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