Multiscale nanopatterns templated from two-dimensional assemblies of photoresist particles

Abstract

Multiscale nanopatterns fabricated by colloidal lithography, using two-dimensional self-assemblies of photoresist particles as masks, are presented. The colloidal masks with features of multiple length scales are obtained by photolithography and used for constructing submicrometer-hole arrays over large areas (see Figure). By depositing functional materials through these masks, nanopatterned substrates useful in a wide range of applications can be produced.