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College of Engineering(공과대학)Dept. of Chemical and Biomolecular Engineering(생명화학공학과)CBE-Journal Papers(저널논문)

Multiscale nanopatterns templated from two-dimensional assemblies of photoresist particles

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dc.contributor.authorMoon, JHko
dc.contributor.authorJang, SGko
dc.contributor.authorLim, JMko
dc.contributor.authorYang, Seung-Manko
dc.date.accessioned2009-11-16T02:40:22Z-
dc.date.available2009-11-16T02:40:22Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2005-11-
dc.identifier.citationADVANCED MATERIALS, v.17, pp.2559 - +-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/12621-
dc.description.abstractMultiscale nanopatterns fabricated by colloidal lithography, using two-dimensional self-assemblies of photoresist particles as masks, are presented. The colloidal masks with features of multiple length scales are obtained by photolithography and used for constructing submicrometer-hole arrays over large areas (see Figure). By depositing functional materials through these masks, nanopatterned substrates useful in a wide range of applications can be produced.-
dc.description.sponsorshipNational R&D Project for Nano Science and Technology of the Ministry of Commerce, Industry and Energy. Center for Nanoscale Mechatronics and Manufacturing through the 21st Century Frontier. Research Program (M102 KN010002–05 K1401–00214). The BK21 and CUPS-ERC programs.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectNANOSPHERE LITHOGRAPHY-
dc.subjectCOLLOIDAL CRYSTALS-
dc.subjectARRAYS-
dc.subjectSURFACE-
dc.subjectPOLYSTYRENE-
dc.subjectSIZE-
dc.subjectNANOPARTICLES-
dc.subjectFABRICATION-
dc.subjectINTEGRATION-
dc.subjectSCALE-
dc.titleMultiscale nanopatterns templated from two-dimensional assemblies of photoresist particles-
dc.typeArticle-
dc.identifier.wosid000233226900005-
dc.identifier.scopusid2-s2.0-27744567636-
dc.type.rimsART-
dc.citation.volume17-
dc.citation.beginningpage2559-
dc.citation.endingpage+-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.200501167-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYang, Seung-Man-
dc.contributor.nonIdAuthorMoon, JH-
dc.contributor.nonIdAuthorJang, SG-
dc.contributor.nonIdAuthorLim, JM-
dc.type.journalArticleArticle-
dc.subject.keywordPlusNANOSPHERE LITHOGRAPHY-
dc.subject.keywordPlusCOLLOIDAL CRYSTALS-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusPOLYSTYRENE-
dc.subject.keywordPlusSIZE-
dc.subject.keywordPlusNANOPARTICLES-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusINTEGRATION-
dc.subject.keywordPlusSCALE-
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