Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material for 157 nm optical lithography
- Publisher
- SPIE
- Issue Date
- 2002-03-06
- Language
- English
- Citation
Optical Microlithography XV, pp.1696 - 1702
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.