DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, S | ko |
dc.contributor.author | Choi, E | ko |
dc.contributor.author | Kim, H | ko |
dc.contributor.author | Kim, J | ko |
dc.contributor.author | No, Kwangsoo | ko |
dc.date.accessioned | 2013-03-16T01:19:41Z | - |
dc.date.available | 2013-03-16T01:19:41Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2002-03-06 | - |
dc.identifier.citation | Optical Microlithography XV, pp.1696 - 1702 | - |
dc.identifier.uri | http://hdl.handle.net/10203/125954 | - |
dc.language | English | - |
dc.publisher | SPIE | - |
dc.title | Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material for 157 nm optical lithography | - |
dc.type | Conference | - |
dc.identifier.wosid | 000178104200169 | - |
dc.identifier.scopusid | 2-s2.0-0036411703 | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 1696 | - |
dc.citation.endingpage | 1702 | - |
dc.citation.publicationname | Optical Microlithography XV | - |
dc.identifier.conferencecountry | US | - |
dc.identifier.conferencelocation | Santa Clara, CA | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Kim, S | - |
dc.contributor.nonIdAuthor | Choi, E | - |
dc.contributor.nonIdAuthor | Kim, H | - |
dc.contributor.nonIdAuthor | Kim, J | - |
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