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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material for 157 nm optical lithography

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dc.contributor.authorKim, Sko
dc.contributor.authorChoi, Eko
dc.contributor.authorKim, Hko
dc.contributor.authorKim, Jko
dc.contributor.authorNo, Kwangsooko
dc.date.accessioned2013-03-16T01:19:41Z-
dc.date.available2013-03-16T01:19:41Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2002-03-06-
dc.identifier.citationOptical Microlithography XV, pp.1696 - 1702-
dc.identifier.urihttp://hdl.handle.net/10203/125954-
dc.languageEnglish-
dc.publisherSPIE-
dc.titleSimulation and characterization of silicon oxynitrofluoride films as a phase shift mask material for 157 nm optical lithography-
dc.typeConference-
dc.identifier.wosid000178104200169-
dc.identifier.scopusid2-s2.0-0036411703-
dc.type.rimsCONF-
dc.citation.beginningpage1696-
dc.citation.endingpage1702-
dc.citation.publicationnameOptical Microlithography XV-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSanta Clara, CA-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorKim, S-
dc.contributor.nonIdAuthorChoi, E-
dc.contributor.nonIdAuthorKim, H-
dc.contributor.nonIdAuthorKim, J-
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MS-Conference Papers(학술회의논문)
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