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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

New dry-developable chemically amplified photoresist

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Kim, Jin-Baekresearcher / Kim, Hyun-Woo
Publisher
SPIE
Issue Date
1998-02-23
Language
English
Citation

Advances in Resist Technology and Processing XV, pp.786 - 793

ISSN
0361-0748
URI
http://hdl.handle.net/10203/124058
Appears in Collection
CH-Conference Papers(학술회의논문)
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