New dry-developable chemically amplified photoresist
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.contributor.author | Kim, Hyun-Woo | ko |
| dc.date.accessioned | 2013-03-15T21:26:38Z | - |
| dc.date.available | 2013-03-15T21:26:38Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1998-02-23 | - |
| dc.identifier.citation | Advances in Resist Technology and Processing XV, pp.786 - 793 | - |
| dc.identifier.issn | 0361-0748 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/124058 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | New dry-developable chemically amplified photoresist | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000075444000079 | - |
| dc.identifier.scopusid | 2-s2.0-60849108347 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 786 | - |
| dc.citation.endingpage | 793 | - |
| dc.citation.publicationname | Advances in Resist Technology and Processing XV | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Santa Clara, CA | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Kim, Hyun-Woo | - |
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