New crystallization Process of LPCVD a- Si Films below 530 C Using Metal Adsorption Method
- Issue Date
- 1995
- Language
- ENG
- Citation
the 1995 International Conference on Solid State Devices and Materials (SSDM95), pp.902 - 904
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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