Si Etch Rate Calculation Using an Ion Energy Distribution Function of RF Biased LPHD Cl2 Plasma
- Issue Date
- 1998
- Language
- ENG
- Citation
Bulletin of American Physical Society, pp.1931 - 1932
- Appears in Collection
- PH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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