MOCVD 반응기의 샤워헤드의 구조가 박막증착속도의 균일도에 미치는 영향Effect of the Showerhead Structure of MOCVD Reactor on the Uniformity of Deposition Rate of Thin Film
- Issue Date
- 1995-10
- Language
- KOR
- Citation
v.1, no.2, pp.1345 - 1348
- Appears in Collection
- CBE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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