MOCVD 반응기의 샤워헤드의 구조가 박막증착속도의 균일도에 미치는 영향Effect of the Showerhead Structure of MOCVD Reactor on the Uniformity of Deposition Rate of Thin Film
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정원영 | - |
| dc.contributor.author | 김도현 | - |
| dc.date.accessioned | 2013-03-15T13:02:18Z | - |
| dc.date.available | 2013-03-15T13:02:18Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1995-10 | - |
| dc.identifier.citation | , v.1, no.2, pp.1345 - 1348 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/119686 | - |
| dc.language | KOR | - |
| dc.title | MOCVD 반응기의 샤워헤드의 구조가 박막증착속도의 균일도에 미치는 영향 | - |
| dc.title.alternative | Effect of the Showerhead Structure of MOCVD Reactor on the Uniformity of Deposition Rate of Thin Film | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.volume | 1 | - |
| dc.citation.issue | 2 | - |
| dc.citation.beginningpage | 1345 | - |
| dc.citation.endingpage | 1348 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 김도현 | - |
| dc.contributor.nonIdAuthor | 정원영 | - |
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